Download Alternative Lithography: Unleashing the Potentials of by Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor PDF

Download Alternative Lithography: Unleashing the Potentials of by Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor PDF

By Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor Torres (eds.)

Good previous Gutenberg couldn't have imagined that his innovative printing inspiration which so vastly contributed to dissemination of information and therefore this present day 's wealth, may were a resource of proposal years later. Now, it sort of feels intuitive easy option to produce a great number of replicates is utilizing a mildew to emboss trend you would like, yet on the nanoscale not anything is straightforward: the satan is within the aspect. And this e-book is ready the "devil". within the following 17 chapters, the authors-all of them good well-known and lively actors during this rising field-describe the state of the art, this day 's technological bottlenecks and the customers for micro-contact printing and nanoimprint lithography. Many result of this booklet originate from tasks funded by way of the ecu Com­ venture via its "Nanotechnology details units" (NID) initiative. NID used to be introduced with the target to boost nanoscale units for the time while the purple­ brick situation of the ITRS roadmap will be reached. It turned quickly transparent even though, that there has been no aspect to enquire purely replacement units to CMOS, yet what was once quite wanted was once an built-in procedure that took into consideration extra points of this tough venture. Technologically conversing , this intended to have a coherent technique to enhance novel units, nanofabrication instruments and circuit & procedure architectures on the similar time.

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C. Scheer, H. Schulz, T. Hoffmann and C. M. Sotomayor Torres, in: H. S. ) Handbook of Thin Film Materials, vol. 5, Academic Press, place, 2002, pp 1-60. 5. R. Feynmann, talk at the California Institute of Technology, 29t h December 1959. 6. H. Tan, A. Gilberston and S. Y. Chou , J Vac Sci Technol B 163926 (1998) . 7. B. Heidari , I. Maximov, E-L. Sarwe and L. Montelius, J. Technol B 18,3552-6 (2000) . 8. T. Haatainen, J. Ahopelto, G. Gruetzner, M. Fink and K. Pfeiffer, Proc SPIE 3997 874-80 (2000).

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3-D PATTERNING Another unique feature of NIL is that it is a 3 dimensional pattern technology, rather than a 2D patterning as in other lithographies. The 3D features are very desirable some applications, such as microwave and MEMS . For example, the "T" gate for microwave transistors has a narrow foot print for high speed , but wide top for lower resistance. 3. SEM micrograph of a top view of 60 nm deep holes imprinted into PMMA which have a 10 nm minimum diameter and a period of 40 nm. , • • • ..

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